| 低强度X射线成像仪性能影响因素的研究 |
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| 引用本文： | 卫广远.低强度X射线成像仪性能影响因素的研究[J].长春理工大学学报,1992(1). |
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| 作者姓名： | 卫广远 |
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| 作者单位： | 长春光学精密机械学院光学物理系 |
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| 摘 要： | 本文从理论分析和实验研究入手,对刚问世的低强度X射线成像仪(Lixis-lope)进行深入地探讨,给出C_sI光电阳极的x射线响应特性、制备工艺和最佳涂层条件,综合地分析和研究了影响成象仪像质的各种因素,其中包括X射线管焦斑,像增强器阴极,板屏间近帖间距及电源系统等。同时实验研制出了一台手提式低强度X射线式像仪样机。
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| 关 键 词： | X射线 像增强器 微通道板碘化铯 (CsI)光电阳极 开关电源 |
The Study of Low Intensity X-ray Image Scope |
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| Wei Guangyuan.The Study of Low Intensity X-ray Image Scope[J].Journal of Changchun University of Science and Technology,1992(1). |
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| Authors: | Wei Guangyuan |
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| Affiliation: | Wei Guangyuan |
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| Abstract: | Ths paper, which comes from analyse and experiment, probes throughly into the new Lixi- cope. It presents low X-ray respenses to the cesinm iodide photocathode and it deals with the technol- ogy of manufacturing and the best condition of film. This caticle also studies and researdes all kinds of factors which collect the quality of the image scope, including the lows of X-ray tube, the X-ray photocathode the space between MCP and screen, and the electro power, etc. Consequently, a hand, high resolution low intensity X-ray image scope was developed. |
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