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Microstructure and properties of CVD γ-Al2O3 coatings
Authors:A Larsson and S Ruppi
Affiliation:

a Chalmers University of Technology, SE-412 96, Göteborg, Sweden

b Research and Development, Seco Tools AB, SE-737 82, Fagersta, Sweden

Abstract:This work deals with the microstructures and wear properties of chemical vapour deposited γ-Al2O3. The γ-Al2O3 coatings were deposited at 800 °C on TiN and Ti(C,N) pre-coated cemented carbide substrates. The microstructures developed in the γ-Al2O3 coatings and the influence of the nucleation surface on the growth of γ-Al2O3 were characterised using transmission electron microscopy, electron energy-loss spectroscopy and X-ray diffraction. The γ-Al2O3 coatings were fine-grained with a high density of {1 1 1} growth twins and contained some residual sulphur. γ-Al2O3 was found to grow epitaxially on the investigated substrates. The mechanical properties were evaluated in metal cutting and were compared with those of κ-Al2O3 coated tools. As compared with the κ-Al2O3 coatings, the γ-Al2O3 coatings exhibited slightly worse adhesion and tendency for edge chipping. However, the γ-Al2O3 coatings showed better crater wear resistance on the rake face than κ-Al2O3 coatings.
Keywords:Chemical vapour deposition  Alumina  TEM  EELS  XRD
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