| CDT 黑底制作中常见的不良分析及对策 |
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| 引用本文： | 何宏玉,金兴隆. CDT 黑底制作中常见的不良分析及对策[J]. 电子器件, 2002, 25(1): 63-66 |
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| 作者姓名： | 何宏玉 金兴隆 |
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| 作者单位： | 国家特种显示工程技术研究中心,芜湖电真空研究所,安徽,芜湖,241000 |
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| 摘 要： | 高亮度高分辨小屏面CDT的黑底制作常见的不良的原因分析及应采取的对策，它有别于一般CDT黑底制作。
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| 关 键 词： | 光致抗蚀剂 黑底 荫罩 曝光 彩色显示管 |
| 文章编号： | 1005-9490(2002)01-0063-04 |
| 修稿时间： | 2001-09-14 |
An Analysis of the Ill Phenomena in the Process ofMaking the Black Matrix of CDT and Its Countermeasures |
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| HE Hongyu,JIN Xinglong. An Analysis of the Ill Phenomena in the Process ofMaking the Black Matrix of CDT and Its Countermeasures[J]. Journal of Electron Devices, 2002, 25(1): 63-66 |
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| Authors: | HE Hongyu JIN Xinglong |
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| Affiliation: | Wu hu Electronic Vacuum Institute |
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| Abstract: | This assay is intended to make an analysis of the ill phenomena in the process of making the black matrix of the gigh brightness, the high resolution and small screen CDT and proposes countermeasures. On the basis of the analysis it is concluded that it is different from the normal. |
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| Keywords: | photoresistance black matrix shadowmask expose |
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