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纳米异质外延层与衬底的晶体取向匹配的电子背散射衍射分析
引用本文:吉元,王丽,张隐奇,卫斌,索红莉,王建宏,程艳玲.纳米异质外延层与衬底的晶体取向匹配的电子背散射衍射分析[J].电子显微学报,2010,29(4):322-327.
作者姓名:吉元  王丽  张隐奇  卫斌  索红莉  王建宏  程艳玲
作者单位:1. 北京工业大学,固体微结构与性能研究所,北京,100124
2. 北京工业大学,材料学院,北京,100124
基金项目:国家973资助项目,国家973资助项目,北京市自然科学基金资助项目 
摘    要:本文采用电子背散射衍射(EBSD),测量纳米异质外延层的织构,及外延层与衬底的晶体取向匹配。测试的材料包括作为YBCO超导膜的过渡层、生长在强立方织构Ni-5at.%W(Ni-W)衬底上的La2Zr2O7(LZO)外延层,及LED器件中生长在蓝宝石衬底上的GaN过渡层和外延层。EBSD测量出LZO外延层具有旋转立方织构,显示出LZO与Ni-W衬底的面内取向(转动45°)及面外取向(沿001]方向)的匹配关系。EBSD测量出GaN过渡层与蓝宝石衬底的面内取向(转动30°)的匹配关系,显示出由GaN过渡层的晶格畸变而引入的平行于外延生长方向的弹性应变梯度(约500 nm)。

关 键 词:电子背散射衍射(EBSD)  晶体取向错配  外延层  La2Zr2O7  GaN

Electron backscatter diffraction analysis on crystal orientation match of nano-scaled heteroepitaxial layers with the substrates
JI Yuan,WANG Li,ZHANG Yin-qi,WEI Bin,SUO Hong-li,WANG Jian-hong,CHENG Yan-ling.Electron backscatter diffraction analysis on crystal orientation match of nano-scaled heteroepitaxial layers with the substrates[J].Journal of Chinese Electron Microscopy Society,2010,29(4):322-327.
Authors:JI Yuan  WANG Li  ZHANG Yin-qi  WEI Bin  SUO Hong-li  WANG Jian-hong  CHENG Yan-ling
Affiliation:JI Yuan1,WANG Li1,ZHANG Yin-qi1,WEI Bin1,SUO Hong-li2,WANG Jian-hong2,CHENG Yan-ling2(1.Beijing University of Technology,Institute of Microstructure and Property of Advanced Materials,2.Beijing University of Technology,Institute of Materials Science and Engineering,Beijing 100124,China)
Abstract:The electron backscatter diffraction(EBSD) was used to measure textures and correlations of crystal orientations between nano-scaled heteroepilayers and substrates.The measured materials include La2Zr2O7(LZO) buffer layer as YBCO superconductor films deposited on a Ni-5at.% W(Ni-W) substrate with a strong cube texture,as well as GaN buffer layers and GaN epilayer grown on a sapphire substrate in LED devices.The EBSD was used to measure a rotated cube texture of the LZO epilayer and to reveal its relative or...
Keywords:La2Zr2O7  GaN
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