| 沉积参数对Mo-Re合金基体上沉积金刚石薄膜的影响 |
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| 引用本文： | 王健,余志明,吴晓斌,刘倩. 沉积参数对Mo-Re合金基体上沉积金刚石薄膜的影响[J]. 中国有色金属学报, 2011, 21(6) |
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| 作者姓名： | 王健 余志明 吴晓斌 刘倩 |
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| 作者单位： | 中南大学材料科学与工程学院,长沙,410083 |
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| 摘 要： | 采用热丝化学气相沉积法(HFCVD),以甲烷和氢气为反应气体,在综合性能良好的Mo-40%Re(摩尔分数)合金基体上沉积金刚石薄膜.采用X射线衍射仪(XRD)、场发射扫描电子显微镜(FESEM)和显微激光拉曼光谱仪(Raman)分别对金刚石薄膜相组成、表面形貌、晶粒大小和质量等进行检测分析,研究CVD沉积参数,如基体温度(θs)、碳源浓度(R,Cn4的体积分数)和沉积压强(p),对金刚石形核、生长和金刚石成膜的影响.结果表明在合适的基体预处理条件下,当θs=750℃,R=-3%,p=3.5kPa时,薄膜平均线生长速率高达1μm/h,得到的金刚石膜完整致密,晶粒大小均匀,纯度较高,具有明显的(111)织构.
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| 关 键 词： | 金刚石薄膜 Mo-Re合金 Raman光谱 阴极材料 |
Effects of deposition parameters on diamond film on Mo-Re alloy substrate |
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| WANG Jian,YU Zhi-ming,WU Xiao-bin,LIU Qian. Effects of deposition parameters on diamond film on Mo-Re alloy substrate[J]. The Chinese Journal of Nonferrous Metals, 2011, 21(6) |
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| Authors: | WANG Jian YU Zhi-ming WU Xiao-bin LIU Qian |
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| Affiliation: | WANG Jian,YU Zhi-ming,WU Xiao-bin,LIU Qian (School of Materials Science and Engineering,Central South University,Changsha 410083,China) |
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| Abstract: | The diamond films were prepared on Mo-40%Re(mole fraction) alloy substrates by hot filament chemical vapor deposition(HFCVD) in a reactor with a background pressure of 10-5 Pa.The interlayer,diamond morphologies and the purity of the film were investigated by X-ray diffractometer(XRD),field emission scanning electron microscope(SEM) and Raman spectroscope(Raman),respectively.Meanwhile,the effects of process parameters,such as substrate temperature,gas composition and reactor pressure,on diamond growth were ... |
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| Keywords: | diamond film Mo-Re alloy Raman spectroscope cathode material |
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