Application of Wet Chemical Etching in Fabrication Process of GaAs/AlGaAs Quantum Dot Arrays |
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Affiliation: | National Laboratory for Superlattices and Microstructures,Institute of Semiconductors,The Chinese Academy of Sciences,Beijing 100083,China |
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Abstract: | Two types of GaAs/AlGaAs quantum dot arrays with different dot size are fabricated by dry etching and dry-wet etching. PL spectra of the quantum dot arrays at low temperature show the blue shifts due to the quantization confinement effects, and the blue-shift increases with the decrease of the dot size. It is also found that wet chemical etching can reduce the surface damage caused by high-energy ion etching and improve the optical characteristics of the quantum dot arrays. |
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Keywords: | Quantum Dot Arrays Chemical Etching |
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