| 制备ITO薄膜的磁控反应溅射镀膜设备的研制 |
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| 引用本文： | 常天海,江豪成. 制备ITO薄膜的磁控反应溅射镀膜设备的研制[J]. 真空与低温, 1998, 4(3): 156-160 |
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| 作者姓名： | 常天海 江豪成 |
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| 作者单位： | 兰州物理研究所 |
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| 摘 要： | 提出了制备氧化铟锡薄膜（ＩＴＯ）的磁控反应溅射镀膜设备的关键部件的设计原则。给出了该设备的调试结果。
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| 关 键 词： | ITO薄膜 镀膜设备 研制 |
THE DEVELOPMENT OF MAGNETRON REACTIVE SPUTTERING COATING EQUIPMENT FOR PREPARATION OF ITO FILM |
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| Chang Tianhai Jiang Haocheng Zhao Guangping. THE DEVELOPMENT OF MAGNETRON REACTIVE SPUTTERING COATING EQUIPMENT FOR PREPARATION OF ITO FILM[J]. Vacuum and Cryogenics, 1998, 4(3): 156-160 |
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| Authors: | Chang Tianhai Jiang Haocheng Zhao Guangping |
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| Abstract: | The design ruling on the key parts of the magnetron reactive sputtering coating equipment for preparation of ITO film has been introduced in the paper.The test results of the coating equipment have been given. |
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| Keywords: | ITO film Coating equipment Development. |
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