首页 | 本学科首页   官方微博 | 高级检索  
     

空心阴极离子镀沉积Ti(CN)的最佳工艺参数及其耐磨性能研究
引用本文:陈罡,谭俊,朱绍华,张振学.空心阴极离子镀沉积Ti(CN)的最佳工艺参数及其耐磨性能研究[J].中国表面工程,1997(4).
作者姓名:陈罡  谭俊  朱绍华  张振学
作者单位:装甲兵工程学院!100072
摘    要:运用正交试验法进行了空心阴极离子镀(HCD)沉积Ti(CN)最佳工艺参数的研究。采用反应气体总分压、乙炔气与氮气的分压比及烘烤温度作为试验的三个变化的因素。比较了Ti(CN)、TiN及TiC的耐磨性能,结果表明Ti(CN)膜比TiC、TiN膜性能更优异。用X射线衍射(XRD)分析了Ti(CN)膜层的相结构及组成。

关 键 词:空心阴极离子镀(HCD)  碳氮化钛Ti(CN))

Study of the Optimum Deposition Parameters and Wear Resistance or HCD Ti(CN) coating
Chen Gang,Tan Jun,Zhu Shaohu,Zhang Zhenxue.Study of the Optimum Deposition Parameters and Wear Resistance or HCD Ti(CN) coating[J].China Surface Engineering,1997(4).
Authors:Chen Gang  Tan Jun  Zhu Shaohu  Zhang Zhenxue
Affiliation:Chen Gang ;Tan Jun; Zhu Shaohua; Zhang Zhenxue
Abstract:In this paper, the optimum deposition parameters of hollow cathode deposition Ti(CN) coating were studied with the orthogonal experiment methode. The total pressure of reactive gas, the pressure ratio of acetylene to nitride and the heated temperature were the three deposition parameters in the experiment. The wear resistance of Ti(CN), TiN and TiC coatings was studied in this paper. It was discovered that the wear resistance of Ti(CN)coating was better than that of TiN or TiC coating. The composition and structure of Ti(CN) coating had been investigated by X - ray diffraction.
Keywords:Hollow cathode depostition (HCD)  Ti(CN)  
本文献已被 CNKI 等数据库收录!
点击此处可从《中国表面工程》浏览原始摘要信息
点击此处可从《中国表面工程》下载全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号