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Study of magnetic field assisted mechanochemical polishing process for inner surface of Si3N4 ceramic components: Finishing characteristics under wet finishing using distilled water |
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| Authors: | Debin Wang Takeo Shinmura Hitomi Yamaguchi |
| Affiliation: | a School of Mechanical Engineering, Anshan University of Science and Technology, No. 185, Qianshan Road, Anshan, Liaoning 114044, China;b Graduate School of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, Japan;c Faculty of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, Japan |
| Abstract: | This study discusses the finishing characteristics of a magnetic field assisted mechanochemical polishing process using Cr2O3 abrasive mixed with magnetic particles in the case of wet finishing using distilled water, which was proposed for internal finishing of Si3N4 fine ceramic tubes. It was clarified that a highly accurate finishing can be achieved more efficiently in the case of wet finishing using distilled water compared with dry finishing. Moreover, those conditions necessary to achieve high efficiency finishing are discussed. |
| Keywords: | Magnetic field assisted finishing Mechanochemical polishing Surface roughness Internal finishing Silicon nitride ceramics Material removal Chromium-oxide abrasive Distilled water |
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