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Elastic strain and enhanced light emission in dry etched Si/Si1-xGex quantum dots |
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| Authors: | Y S Tang C M Sotomayor Torres S Nilsson B Dietrich W Kissinger T E Whall E H C Parker W X Ni G V Hansson H Presting H Kibbel |
| Affiliation: | 1. Nanoelectronics Research Centre, Department of Electronics & Electrical Engineering, University of Glasgow, G12 8QQ, Glasgow, UK 2. Institut für Halbleiterphysik GmbH, D-15204, Frankfurt (Oder), Germany 3. Department of Physics, University of Warwick, CV4 7AL, Coventry, UK 4. Department of Physics, Link?ping University, S-581 83, Link?ping, Sweden 5. Daimler Benz AG,Research Center, D-89081, Ulm, Germany |
| Abstract: | Quantum dots of 50 ~ 60 nm diameter fabricated from both Si/Si1-xGex (x = 0.1 ~ 0.3) strained layer superlattices and a strain symmetried Si9/Ge6 superlattice were investigated by a combination of Raman scattering, photoluminescence, and electroluminescence spectroscopy. It was found that, in addition to an enhanced luminescence intensity of the dots by over two orders of magnitude and improved luminescence quenching temperature, all of the nanostructure dots have residual built-in elastic strains, which are of the order of ~50% of the values in corresponding pseudomorphic heterostructures. This result suggests a possible mechanism for explaining the huge enhancement of the optical efficiency in our luminescence measurements. |
| Keywords: | Elastic strain luminescence Raman scattering Si-Si1_xGexquantum dots |
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