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| Plasma-nitriding of tantalum at relatively low temperature | |
| 作者姓名： | ZHANG Deyuan LIN Qin ZHAO Haomin FEI Qinyong GENG Man National R & D Center for Surface Engineering of China Shenzhen China University of Science and Technology Beijing Beijing China |
| 作者单位： | ZHANG Deyuan;LIN Qin;ZHAO Haomin;FEI Qinyong;GENG Man National R & D Center for Surface Engineering of China，Shenzhen 518029，China University of Science and Technology Beijing，Beijing 100083，China |
| 摘 要： | The combined quadratic orthogonal regression method of experiment design was employed to explore the effectsof process parameters of plasma nitriding of tantalum such as total pressure, temperature and original hydrogen molar frac-tion on the hardness, roughness and structure of nitriding surfaces. The regression equations of hardness, roughness andstructure were given according to the results of regression and statistic analysis. And the diffusion activation energy of ni-trogen in tantalum on plasma nitriding conditions was calculated according to the experimental data of hardness ofplasma-nitriding of tantalum vs time and temperature. The diffusion activation energy calculated belongs to (155.49±10.51)kJ/mol(783-983K). |
| 关 键 词： | 渗氮等离子体 温度 压力 正交回归法 钽 扩散活化能 硬度 粗糙度 结构 热处理 |
Plasma-nitriding of tantalum at relatively low temperature |
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| ZHANG Deyuan,LIN Qin,ZHAO Haomin,FEI Qinyong,GENG Man National R & D Center for Surface Engineering of China,Shenzhen ,China University of Science and Technology Beijing,Beijing ,China.Plasma-nitriding of tantalum at relatively low temperature[J].Rare Metals,2004,23(2):185-188. | |
| Authors: | Zhang Deyuan LIN Qin ZHAO Haomin FEI Qinyong GENG Man |
| Affiliation: | 1. National R & D Center for Surface Engineering of China, Shenzhen 518029, China;University of Science and Technology Beijing, Beijing 100083, China 2. University of Science and Technology Beijing, Beijing 100083, China 3. National R & D Center for Surface Engineering of China, Shenzhen 518029, China |
| Abstract: | The combined quadratic orthogonal regression method of experiment design was employed to explore the effects of process parameters of plasma nitriding of tantalum such as total pressure, temperature and original hydrogen molar fraction on the hardness, roughness and structure of nitriding surfaces. The regression equations of hardness, roughness and structure were given according to the results of regression and statistic analysis. And the diffusion activation energy of nitrogen in tantalum on plasma nitriding conditions was calculated according to the experimental data of hardness of plasma-nitriding of tantalum vs time and temperature. The diffusion activation energy calculated belongs to (155.49 + 10.51)kJ/mol (783-983 K). |
| Keywords: | surface and interface of materials plasma nitriding orthogonal regression method tantalum |
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