|
|||||
|
|
Solution‐based Fabrication of High‐κ Gate Dielectrics for Next‐Generation Metal‐Oxide Semiconductor Transistors |
|
| Authors: | Y. Aoki T. Kunitake |
| Affiliation: | Topochemical Design Laboratory, Frontier Research System, RIKEN, 2–1 Hirosawa, Wako, Saitama 351–0198, Japan |
| Abstract: | |
| Keywords: | Composite materials Sol– gel processes Thin films |