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Formation of MgAu alloy cathode by photolithography and its application to organic light‐emitting diodes and organic field effect transistors
Authors:Takahito Oyamada  Hiroyuki Sasabe  Chihaya Adachi
Abstract:To make an efficient electron injection electrode by photolithography, we studied MgAu alloy electrodes, which have a low work function and high resistance to humidity and oxygen. The measured work function of MgAu alloy thin film was 3.7 eV, which is comparable with that of a pure Mg layer and ~0.8 eV lower than that of a pure Au layer. This low work function was maintained even after photolithography, suggesting excellent stability for solvent treatment. Investigating organic field‐effect transistor (OFET) characteristics when MgAu alloy comb type source and drain electrodes were used, we successfully obtained n‐type FET operation. Furthermore, organic light‐emitting diodes (OLEDs) demonstrated the efficient electron injection characteristics of the MgAu alloy cathode, which were similar to those of the conventional MgAg cathode. © 2005 Wiley Periodicals, Inc. Electr Eng Jpn, 152(1): 37–42, 2005; Published online in Wiley InterScience ( www.interscience.wiley.com ). DOI 10.1002/ eej.20153
Keywords:MgAu alloy  organic light‐emitting diode  organic field‐effect transistor  photolithography  electron injection
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