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4H-SiC功率MESFET直流I-V特性解析模型
引用本文:徐跃杭,徐锐敏,延波,国云川,王磊. 4H-SiC功率MESFET直流I-V特性解析模型[J]. 微电子学, 2007, 37(1): 1-4
作者姓名:徐跃杭  徐锐敏  延波  国云川  王磊
作者单位:电子科技大学,微波工程系,四川,成都,610054
基金项目:国家重点基础研究发展计划(973计划)
摘    要:提出了一种改进的4H-SiC MESFET大信号直流解析模型。该模型基于栅极下面电荷的二维分布进行分析,在考虑电场相关迁移率、速度饱和及沟道内电荷堆积的基础上,计入沟道长度调制效应,建立基于物理的沟道长度调制效应模型。计算结果表明,计入沟道长度调制效应后的直流模型在饱和区与实测的I-V特性较为吻合。

关 键 词:I-V特性  解析模型
文章编号:1004-3365(2007)01-0001-04
修稿时间:2006-06-22

An Analytical Model of I-V Characteristics of 4H-SiC Power MESFET''''s
XU Yue-hang,XU Rui-min,YAN Bo,GUO Yun-chuan,WANG Lei. An Analytical Model of I-V Characteristics of 4H-SiC Power MESFET''''s[J]. Microelectronics, 2007, 37(1): 1-4
Authors:XU Yue-hang  XU Rui-min  YAN Bo  GUO Yun-chuan  WANG Lei
Affiliation:Dept. o f Microwave Engineering, University of Electronic Science and Technology of China, Chengdu, Sichuan 610054, P. R. China
Abstract:An improved analytical model for 4H-SiC MESFET's was developed,which is based on an analysis of the 2-D distribution of charges under the gate,with field-dependence mobility,velocity saturation,charge buildup and channel-length modulation effects taken into consideration.Simulation results show that the model with channel-length modulation effects included agrees with the measured I-V characteristics in the saturation region.
Keywords:4H-SiC  MESFET
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