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| 氮离子束轰击对电弧离子镀TiN膜层的作用 | |
| 引用本文： | 吕树国,刘常升,李玉海,张罡,毕监智,金光. 氮离子束轰击对电弧离子镀TiN膜层的作用[J]. 材料保护, 2009, 42(2) |
| 作者姓名： | 吕树国 刘常升 李玉海 张罡 毕监智 金光 |
| 作者单位： | 1. 东北大学材料与冶金学院,辽宁,沈阳,110004;沈阳理工大学中俄联合高能束流实验室,辽宁,沈阳,110168 2. 东北大学材料与冶金学院,辽宁,沈阳,110004 3. 沈阳理工大学中俄联合高能束流实验室,辽宁,沈阳,110168 |
| 基金项目： | 科技部国际合作重点项目 |
| 摘 要： | 电弧离子镀膜层中"大颗粒"的存在,降低了膜层质量,限制了其进一步应用.采用俄罗斯UVN 0.5D2I离子束辅助沉积电弧离子镀设备,对高速钢W18Cr4V上沉积的TiN膜层进行了氮离子束轰击.结果表明:TiN膜层表面"大颗粒"完全消失,凹坑浅而平整,粗糙度降低.膜层中较软的Ti和Ti2N向TiN转变,TiN(111)取向逐渐减弱,而(200)取向逐渐增强.膜层的显微硬度由原来的1 980 HV1N升高到2 310HV1N. |
| 关 键 词： | 氮离子束 轰击 电弧离子镀 TiN膜 显微硬度 |
Effect of N~+ Ion Beam Bombardment on the Properties of Arc-Ion-Plated TIN Films |
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| LU Shu-guo,LIU Chang-sheng,LI Yu-hai,ZHANG Gang,BI Jian-zhi,JIN Guang. Effect of N~+ Ion Beam Bombardment on the Properties of Arc-Ion-Plated TIN Films[J]. Journal of Materials Protection, 2009, 42(2) | |
| Authors: | LU Shu-guo LIU Chang-sheng LI Yu-hai ZHANG Gang BI Jian-zhi JIN Guang |
| Affiliation: | LU Shu-guo1,2,LIU Chang-sheng1,LI Yu-hai2,ZHANG Gang2,BI Jian-zhi2,JIN Guang2(1.Department of Material , Metallurgy,Northeast University,Shenyang 110004,China,2. China , Russia Joint Laboratory of High Energy Beam,Sheny-ang University of Technology,Shenyang 110168,China) |
| Abstract: | TiN films were deposi-ted on W18Cr4V high-speed steel substrates using a UVN 0.5 D21 arc ion plating device made in Russia.The effect of N ion bombardment on the phase structure,hardness,and properties of the TiN films were investigated.It was found that the large gran-ules on TiN films disappeared after N+ ion beam bombardment,accompanied by formation of smooth and shallow concavities and decrease of surface roughness.At the same time,relatively soft phases Ti and Ti2 N were converted to TiN along with N +... |
| Keywords: | N ion beam bombardment arc ion plating TiN films microhardness |
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