Growth and characterization of non-polar ZnO thin films by pulsed laser deposition |
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Authors: | J Elanchezhiyan WJ Lee SC Kim |
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Affiliation: | a Electro Ceramics Center, Dong-Eui University, Busan - 614-714, South Korea b Department of Physics, Dong-Eui University, Busan - 614-714, South Korea |
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Abstract: | Non-polar ZnO thin films were fabricated on r-plane sapphire substrates by pulsed laser deposition at various temperatures from 100 to 500 °C. The effects of the substrate temperature on structural, morphological and optical properties of the films were investigated. Based on the X-ray diffraction analysis, the ZnO thin films grown at 300, 400 and 500 °C exhibited the non-polar (a-plane) orientation and those deposited below 300 °C exhibited polar (c-plane) orientation. In the optical properties of non-polar ZnO films, there were two photoluminescence peaks detected. The peaks (near-band edge emission, blue emission) are due to electron transitions from band-to-band and shallow donor level to valence band, respectively. |
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Keywords: | ZnO PLD Thin film Non-polar AFM Coatings |
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