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Obtaining Electrically Conductive Structures by Electrochemical Deposition of Copper onto Substrates of Anodized Aluminum Using Polyfluorochalcones as a Photoresist Layer
Authors:Derevyashkin  S. V.  Soboleva  E. A.  Shelkovnikov  V. V.
Affiliation:1.Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences, 630090, Novosibirsk, Russia
;2.Institute of Laser Physics, Siberian Branch, Russian Academy of Sciences, 630090, Novosibirsk, Russia
;3.Novosibirsk State Technical University, 630073, Novosibirsk, Russia
;
Abstract:Russian Microelectronics - The approaches used to the form electrically conductive structures on aluminum and anodized aluminum substrates using such photoresists as synthesized triacrylamide...
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