GaN-based light-emitting diodes prepared on vicinal sapphire substrates

Thin InGaN epitaxial layers and GaN-based light-emitting diodes (LEDs) on conventional and vicinal cut sapphire substrates are prepared. It is found that indium atoms are distributed much more uniformly in the samples prepared on vicinal cut sapphire substrates. It is also found that stronger electroluminescence intensity can be achieved without the band-filling effect of localised states from the LEDs with vicinal cut sapphire substrate. With 20 mA current injection, it is found that 44% electroluminescence intensity enhancement can be achieved by using the 1deg tilted sapphire substrate