Effects of In Situ $hbox{O}_{2}$ Plasma Treatment on off-State Leakage and Reliability in Metal-Gate/High- $k$ Dielectric MOSFETs |
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| Authors: | Kyong Taek Lee Chang Yong Kang Byung Sun Ju Choi R. Kyung Seok Min Ook Sang Yoo Byoung Hun Lee Jammy R. Lee J.C. Hi-Deok Lee Yoon-Ha Jeong |
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| Affiliation: | SEMATECH, Austin, TX; |
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| Abstract: | The effects of in situ O2 plasma treatment on device characteristics and reliability of metal-gate/high-k devices are investigated systematically. It was found that the O2 plasma treatment can be employed for mitigating the formation of a leakage path between the high-k dielectric and the capping nitride layer. It also did not change the threshold voltage (Vth), carrier mobility, or equivalent oxide thickness. Compared with the control samples, the O2 plasma-treated samples achieved a 20-times lower OFF-state current and enhanced hot-carrier-injection stress immunity. |
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