| 磁控溅射法制备PET基纳米TiO2膜的XPS表征 |
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| 引用本文： | 王荣,齐宏进. 磁控溅射法制备PET基纳米TiO2膜的XPS表征[J]. 青岛大学学报(工程技术版), 2004, 19(1): 42-46 |
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| 作者姓名： | 王荣 齐宏进 |
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| 作者单位： | 青岛大学化工学院,山东,青岛,266071;青岛大学化工学院,山东,青岛,266071 |
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| 摘 要： | 利用磁控反应溅射法制备了PET基TiO2薄膜，并用XPS进行了组成结构表征。发现溅射生成的薄膜上存在着多种价态的Ti，No：NTi偏离化学计量比2，即在溅射过程中还能生成Ti2O3及TiO等组分。研究了不同工作压力、不同溅射气体对溅射生成的PET基TiOx膜的各组分百分含量以及氧钛比的影响，并分析了产生这种结果的可能原因和影响因素。
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| 关 键 词： | 磁控反应溅射 TiO2薄膜 PET XPS |
| 文章编号： | 1006-9798(2004)01-0042-05 |
| 修稿时间： | 2003-09-24 |
Characterization by Means of XPS of Nano-Sized TiO2 Films on PET Substrate Prepared by Magnetron Sputtering |
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| WANG Rong,QI Hong-jin. Characterization by Means of XPS of Nano-Sized TiO2 Films on PET Substrate Prepared by Magnetron Sputtering[J]. Journal of Qingdao University(Engineering & Technology Edition), 2004, 19(1): 42-46 |
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| Authors: | WANG Rong QI Hong-jin |
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| Abstract: | The TiO_2 films were prepared on PET substrate by magnetron sputtering and were characterized by XPS. There were various valence states of Ti on the substrate and the stoichiometric ratio of N_O:N_(Ti) was deviated to 2, i.e., Ti_2O_3 and TiO were also produced within sputtering process. The influences of different working pressures, the volume ratio of O_2 and Ar on the film composition and N_O:N_(Ti) were also studied and the possible reasons that may lead to this result were analyzed. |
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| Keywords: | magnetron sputtering Titanium dioxide film PET XPS |
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