Annealing and oxidation study of Ta-Ru hard coatings

Refractory metal alloy coatings have been widely used as protective coatings on glass molding dies. The formation of intermetallic compounds in the coatings inhibits grain growth at high-temperature environment in the mass production of optical components. The current work presents Ta-Ru coatings with a Cr interlayer on cemented carbide substrates and silicon wafers deposited by direct current magnetron co-sputtering at 400 °C. The as-deposited Ta-Ru coatings possessed a hardness of 13-14 GPa and a surface roughness of 1.3-4.0 nm. The annealing treatments were carried out at 600 °C under two vacuum levels of 3 × 10^− 3 and 3 Pa, respectively. After annealing in vacuum at 3 × 10^− 3 Pa, the Ta-Ru coatings showed grain size, hardness, surface roughness and phase stability comparable to those of the as-deposited coatings. While annealing in vacuum at 3 Pa, preferential oxidation of Ta in the Ta-Ru coatings was verified by X-ray photoelectron spectroscopy, a variation of the chemical composition in depth was analyzed by Auger electron spectroscopy and the internal oxidation zone consisting of a laminated structure was observed by transmission electron microscopy.