喷墨打印量子点薄膜制备的影响因素研究

目的 为了通过喷墨打印技术很好地实现量子点薄膜图案化，需要调节量子点薄膜制备工艺的各项参数以获得表面均匀、厚度适宜和无咖啡环结构的量子点薄膜。方法 基板和退火是影响量子点薄膜成膜性能的2个重要参数，分别研究基板的清洗、材料和温度以及退火的温度和时间对喷墨打印量子点薄膜成膜性能的影响。结果 选择3种不同类型的溶剂依次清洗可提高基板表面能，有利于墨水的铺展;PVK基板的量子点面薄膜形貌相较于Pedot:Pss更均匀;当基板温度为50 ℃、退火温度为80 ℃或90 ℃、退火时间为15 min时，咖啡环效应最弱，可获得表面均匀、厚度适宜和无咖啡环结构的量子点薄膜。结论 基板的清洗、自身材料以及温度都会影响墨水的铺展性能，从而影响量子点薄膜的成膜性能;控制退火温度与退火时间，以使马兰戈尼流起作用，咖啡环效应被明显抑制，可以获得表面均匀的量子点薄膜。

Factors Affecting the Preparation of Quantum Dot Films by Inkjet Printing

In order to realize the pattern of quantum dot films by inkjet printing technology, the work aims to adjust the parameters of the preparation process of quantum dot films to obtain the films with uniform surface, suitable thickness and no coffee ring structure. Substrate and annealing were two important parameters that affected the film forming performance of quantum dot films. The effects of substrate cleaning, material and temperature, and annealing temperature and time on the film forming performance of inkjet printing quantum dot films were studied respectively. Three different types of solvents were chosen to clean the substrate in sequence, improving the surface energy of substrate, which was conducive to the spread of ink. Compared with Pedot:Pss, the film morphology of quantum dot surface on PVK substrate was more uniform. When the substrate temperature was 50 ℃, the annealing temperature was 80 ℃ or 90 ℃, and the annealing time was 15 minutes, the coffee ring effect was the weakest, and the quantum-dot films with uniform surface, suitable thickness and no coffee ring structure were obtained. The cleaning of the substrate, its own material and temperature will affect the spreading performance of the ink, and thus affect the forming performance of the quantum dot film. Annealing temperature and annealing time are controlled to make the the Marangoni Stream work, the coffee ring effect is suppressed obviously, and the uniform surface of quantum dot films can be obtained.