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大面积VHF-PECVD反应室喷淋式平板电极间电场和流场数值模拟
引用本文:葛洪,张晓丹,赵静,赵颖.大面积VHF-PECVD反应室喷淋式平板电极间电场和流场数值模拟[J].真空,2010,47(2).
作者姓名:葛洪  张晓丹  赵静  赵颖
作者单位:1. 南开大学光电子薄膜器件与技术研究所,南开大学光电子薄膜器件与技术天津市重点实验室,光电信息技术科学教育部重点实验室(南开大学,天津大学)天津,300071
2. 天津新华职工大学,天津,300040
基金项目:国家重点基础研究发展计划项目,国家自然科学基金,南开大学博士启动基金,科技部国际合作重点项目,国家高技术研究发展计划,教育部新世纪人才计划( 
摘    要:以大面积喷淋式平板电极甚高频等离子体增强化学气相沉积(VHF-PECVD)反应室为研究对象,利用FlexPDE和CFD-ACE+商业软件,对反应室电极间的电场和流场分布进行了数值模拟。根据数值模拟结果可知:对于大面积喷淋式平板电极VHF-PECVD反应室,电极间气体流速分布呈现管流特征,而气压分布和电场分布具有类似的分布规律,即在大面积电极中央区域电场较强气压较高,而电极边缘区域电场较弱气压较低;另外,反应室采用喷淋式平板电极进行反应气体馈入,气体总流量、工作气压和电极间距是调节电极间气压分布均匀性的重要参量,采用大电极间距、高工作气压,以及小的气体总流量有助于获得均匀的气压分布。

关 键 词:甚高频等离子体增强化学气相沉积  喷淋式平板电极  数值模拟

Numerical simulation of electric field and flow field between large-area parallel-plate electrodes of VHF-PECVD Reactor
GE Hong,ZHANG Xiao-dan,ZHAO Jing,ZHAO Ying.Numerical simulation of electric field and flow field between large-area parallel-plate electrodes of VHF-PECVD Reactor[J].Vacuum,2010,47(2).
Authors:GE Hong  ZHANG Xiao-dan  ZHAO Jing  ZHAO Ying
Affiliation:GE Hong1,ZHANG Xiao-dan1,ZHAO Jing2,ZHAO Ying1(1.Institute of Photo-electronics Thin Film Devices , Technique of Nankai University,Key Laboratory of Photo-electronics Thin Film Devices , Technique of Tianjin,Key Laboratory of Photo-electronic Information Science , Technology(Nankai University),Ministry of Education,Tianjin 300071,China,2.Tianjin Xinhua Staff , Workers University,Tianjin 300040,China)
Abstract:The VHF-PECVD(very high frequency plasma enhanced chemical vapor deposition) reactor with large-area spraying parallel-plate electrodes was investigated via a numerical simulation of the distributions of the electric field and flow field between the electrodes by use of the commercial software FlexPDE and CFD-ACE +.The numerical simulation results showed that the distribution of gas flowrate between such electrodes presents the characteristics of pipe flow and both the electric field and gas pressure are di...
Keywords:CFD-ACE+
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