| 大面积VHF-PECVD反应室喷淋式平板电极间电场和流场数值模拟 |
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| 引用本文： | 葛洪,张晓丹,赵静,赵颖. 大面积VHF-PECVD反应室喷淋式平板电极间电场和流场数值模拟[J]. 真空, 2010, 47(2) |
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| 作者姓名： | 葛洪 张晓丹 赵静 赵颖 |
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| 作者单位： | 1. 南开大学光电子薄膜器件与技术研究所,南开大学光电子薄膜器件与技术天津市重点实验室,光电信息技术科学教育部重点实验室(南开大学,天津大学)天津,300071
2. 天津新华职工大学,天津,300040 |
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| 基金项目： | 国家重点基础研究发展计划项目，国家自然科学基金，南开大学博士启动基金，科技部国际合作重点项目，国家高技术研究发展计划，教育部新世纪人才计划( |
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| 摘 要： | 以大面积喷淋式平板电极甚高频等离子体增强化学气相沉积(VHF-PECVD)反应室为研究对象,利用FlexPDE和CFD-ACE+商业软件,对反应室电极间的电场和流场分布进行了数值模拟。根据数值模拟结果可知:对于大面积喷淋式平板电极VHF-PECVD反应室,电极间气体流速分布呈现管流特征,而气压分布和电场分布具有类似的分布规律,即在大面积电极中央区域电场较强气压较高,而电极边缘区域电场较弱气压较低;另外,反应室采用喷淋式平板电极进行反应气体馈入,气体总流量、工作气压和电极间距是调节电极间气压分布均匀性的重要参量,采用大电极间距、高工作气压,以及小的气体总流量有助于获得均匀的气压分布。
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| 关 键 词： | 甚高频等离子体增强化学气相沉积 喷淋式平板电极 数值模拟 |
Numerical simulation of electric field and flow field between large-area parallel-plate electrodes of VHF-PECVD Reactor |
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| GE Hong,ZHANG Xiao-dan,ZHAO Jing,ZHAO Ying. Numerical simulation of electric field and flow field between large-area parallel-plate electrodes of VHF-PECVD Reactor[J]. Vacuum(China), 2010, 47(2) |
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| Authors: | GE Hong ZHANG Xiao-dan ZHAO Jing ZHAO Ying |
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| Affiliation: | GE Hong1,ZHANG Xiao-dan1,ZHAO Jing2,ZHAO Ying1(1.Institute of Photo-electronics Thin Film Devices , Technique of Nankai University,Key Laboratory of Photo-electronics Thin Film Devices , Technique of Tianjin,Key Laboratory of Photo-electronic Information Science , Technology(Nankai University),Ministry of Education,Tianjin 300071,China,2.Tianjin Xinhua Staff , Workers University,Tianjin 300040,China) |
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| Abstract: | The VHF-PECVD(very high frequency plasma enhanced chemical vapor deposition) reactor with large-area spraying parallel-plate electrodes was investigated via a numerical simulation of the distributions of the electric field and flow field between the electrodes by use of the commercial software FlexPDE and CFD-ACE +.The numerical simulation results showed that the distribution of gas flowrate between such electrodes presents the characteristics of pipe flow and both the electric field and gas pressure are di... |
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| Keywords: | CFD-ACE+ |
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