直流电弧等离子体喷射CVD金刚石膜的制备工艺探讨 |
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引用本文: | 方向阳. 直流电弧等离子体喷射CVD金刚石膜的制备工艺探讨[J]. 宁夏工程技术, 2002, 1(3): 246-249 |
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作者姓名: | 方向阳 |
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作者单位: | 宁夏机械研究院,宁夏,银川,750002 |
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摘 要: | 介绍了直流电弧等离子体喷射CVD金刚石膜的沉积原理,探讨了在实际生产过程中获得高质量CVD金刚石膜的工艺条件.
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关 键 词: | 化学气相沉积 金刚石膜 等离子体喷射 |
文章编号: | 1671-7244(2002)03-246-04 |
修稿时间: | 2002-06-27 |
Discussion on the manufacturing technic of the direct current arc plasma jet on CVD diamond film |
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Abstract: | The paper introduces the principle of sediment of direct current arc plasma jet on CVD diamond film and concludes the technic condition of obtaining high quality CVD diamond film in production. |
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Keywords: | chemical vapor deposition diamond film plasma jet |
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