Self‐assembled structures in polystyrene‐block‐polyisoprene‐blend‐polystyrene and polystyrene‐block‐poly(methyl methacrylate)‐blend‐polystyrene or ‐blend‐poly(methyl methacrylate) in the strong segregation regime

This study deals with the investigation of microphase‐separated morphology and phase behaviour in blends of polystyrene‐block‐polyisoprene with homopolystyrene and blends of polystyrene‐block‐poly(methyl methacrylate) with homopoly(methyl methacrylate) or homopolystyrene in the strong segregation regime using small‐angle X‐ray scattering and transmission electron microscopy as a function of composition, molecular weight of homopolymers, r_M and temperature. Parameter r_M = M_H/M_C (where M_H is the molecular weight of homopolymer and M_C that of the corresponding block copolymer) was selected to encompass behaviour of the chains denoted as a ‘wet brush’ (i.e. r_M < 1). The relative domain spacing D/D_o increases in the regime 0 < r_M?1 with increasing concentration of homopolymer w_P and increasing r_M but depends on the specific implemented morphology. We tested a new approximate D/D_o versus w_P relation in the strong segregation regime using block copolymers of high molecular weights. It is shown that the parameters r_M and χ^3/2N determine the slope of the D/D_o versus w_P relation in the strong segregation regime and the new approximation generally matches the experimental data better than the approximations used so far. Copyright © 2010 Society of Chemical Industry