Polarization-insensitive high-dispersion total internal reflection diffraction gratings |
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Authors: | Marciante John R Hirsh Jeffrey I Raguin Daniel H Prince Eric T |
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Affiliation: | Laboratory for Laser Energetics, University of Rochester, Rochester, New York 14623, USA. johnm@lle.rochester.edu |
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Abstract: | We report the first experimental realization of total internal reflection (TIR) diffraction gratings. Performance of less than 0.7-dB insertion loss (IL) for both TE and TM polarizations and 0.5-dB polarization-dependent loss (PDL) are predicted over a 50-nm spectral bandwidth with simultaneous fabrication tolerances on the depth and the duty cycle of binary gratings of +/-5% and +/-14%, respectively. Nineteen gratings were fabricated that met these specifications, yielding IL and PDL values less than 0.6 and 0.2 dB, respectively, across the entire 50-nm bandwidth. Measurements made under the Littrow configuration resulted in high efficiency and low PDL across a 100-nm bandwidth, with up to 100% diffraction efficiency within the experimental measurement error. |
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