Nickel Oxide Interface for Xerographic Selenium Photoreceptors on Flexible Nickel Foils

The paper reports on a method to produce a nickel oxide interface for xerographic selenium alloy photoreceptors on flexible nickel foils. The process consists of an etching treatment in phosphoric acid catalyzed by small amounts of Pd or Pt on the surface and a subsequent electrochemical treatment in a Na₂Cr₂0₇ solution. The catalytic effect of Pd and Pt on the nickel dissolution in phospheric acid is investigated and explained on the basis of electrochemical principles. The etched nickel surface provides excellent adhesion of the photoconducting layer to the nickel substrate. In the subsequent electrochemical anodization treatment, a several hundred A thick nickel oxide layer is formed which reduces electron injection from the interface.