A Simplified Method for Making Accurately Etched Shapes in Molybdenum Foils by a Photo Sensitive Resist Technique |
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Authors: | DEB German JCJ Stewart |
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Affiliation: | Photographic Group, Atomic Energy Research Establishment, Harwell, Berks. |
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Abstract: | Photo etching is a convenient technique for fabricating small metal components, but normally expensive and complex equipment is needed. This report describes a simplified technique for making evaporation masks in molybdenum foil, using standard laboratory equipment of relatively low cost. When using 0.003 in. molybdenum results accurate to ±0.0005 in. (±3 per cent) have been achieved. Accuracy is dependent on a number of factors, which include the photography, the thickness and type of metal and the etching technique. |
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Keywords: | CCTV Image quality Test target Compression Threshold resolution Good enough |
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