| Al含量对非平衡磁控溅射制备Ti1-xAlxN膜性能的影响 |
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| 引用本文： | 张以忱,于大洋,马胜歌,刘艳文,巴德纯.Al含量对非平衡磁控溅射制备Ti1-xAlxN膜性能的影响[J].真空,2007,44(3):1-4. |
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| 作者姓名： | 张以忱 于大洋 马胜歌 刘艳文 巴德纯 |
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| 作者单位： | 1. 东北大学,辽宁,沈阳,110004
2. 深圳国家863计划材料表面工程技术研究开发中心,广东,深圳,518029 |
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| 摘 要： | 将电弧离子镀和中频非平衡磁控溅射工艺相结合制备了Ti1-xAlxN薄膜。利用扫描电镜、能谱仪、X射线衍射仪、显微硬度计、划痕仪、摩擦磨损仪等分析检测仪器研究了不同Al含量Ti1-xAlxN薄膜的性能。结果表明：随Al含量增加,沉积速率变大;各种Al含量的膜层中都有Ti1-xAlxN相;当x为51at.%时薄膜有最高的显微硬度2741.8HV,此时摩擦系数达到最低值0.14;Al含量多时膜层Ti1-xAlxN表面粗糙;各种Al含量的膜层与基体的结合力大致相同,临界载荷都在16～20N左右。
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| 关 键 词： | 硬质膜 非平衡磁控溅射 Al含量 |
| 文章编号： | 1002-0322（2007）03-0001-04 |
| 修稿时间： | 2006-09-20 |
Effect of Al content on properties of Ti1-xAlxN hard film prepared by unbalanced magnetron sputtering |
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| ZHANG Yi-chen,YU Da-Yang,MA Sheng-ge,LIU Yan-wen,BA De-chun.Effect of Al content on properties of Ti1-xAlxN hard film prepared by unbalanced magnetron sputtering[J].Vacuum,2007,44(3):1-4. |
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| Authors: | ZHANG Yi-chen YU Da-Yang MA Sheng-ge LIU Yan-wen BA De-chun |
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| Abstract: | The unbalanced magnetron sputtering process was combined with cathode arc to prepare Ti1-xAlxN films. The mechanical properties of the films with different Al contents were characterized by SEM,XRD,microhardness tester, scratch and pin-on-disc wear testers. The results showed that the deposition rate increases with the increasing Alcontent. The film shows a maxinum micro-hardness value up to 2741.8HV and minimum friction coefficient down to 0. 14 when x is 51at. %. All the films have TiAlN phase. The film surface becames more rough with increasing Al content. The bonding strengths between verious films with different Al content and substrates are almost the same, to which the critical load is about 16--20N. |
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| Keywords: | Ti1-xAlxN |
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