| SU-8光刻胶制作三维光子晶体 |
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| 引用本文： | 张晓玉,高洪涛,周崇喜,刘强,邢廷文,姚汉民. SU-8光刻胶制作三维光子晶体[J]. 光电工程, 2007, 34(8): 28-31 |
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| 作者姓名： | 张晓玉 高洪涛 周崇喜 刘强 邢廷文 姚汉民 |
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| 作者单位： | 中国科学院光电技术研究所,微细加工光学技术国家重点实验室,四川,成都,610209;中国科学院光电技术研究所,微细加工光学技术国家重点实验室,四川,成都,610209;中国科学院光电技术研究所,微细加工光学技术国家重点实验室,四川,成都,610209;中国科学院光电技术研究所,微细加工光学技术国家重点实验室,四川,成都,610209;中国科学院光电技术研究所,微细加工光学技术国家重点实验室,四川,成都,610209;中国科学院光电技术研究所,微细加工光学技术国家重点实验室,四川,成都,610209 |
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| 摘 要： | 针对SU-8光刻胶应用于三维光子晶体的制作研究,本文提出并实现了对SU-8光刻胶的重要成分SU-8环氧树脂采用柱层析和高压液相色谱-尺寸排阻色谱法进行分离,分离结果表明SU-8环氧树脂分子量分布范围很大,从大约100～100000,包括SU-1、SU-2、SU-4、SU-6、SU-8多种组分及其混合物.采用分离后的SU-8和SU-6纯组分配制了性能优化的SU-8光刻胶,并总结了其最佳光刻工艺,结合干涉光刻技术制作了晶格常数为922nm的三维面心立方光子晶体结构.
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| 关 键 词： | SU-8光刻胶 三维光子晶体 柱层析 尺寸排阻色谱法 |
| 文章编号： | 1003-501X（2007）08-0028-04 |
| 收稿时间： | 2006-11-30 |
| 修稿时间： | 2006-11-31 |
Three-dimension photonic crystals fabrication using SU-8 photoresist |
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| ZHANG Xiao-yu,GAO Hong-tao,ZHOU Chong-xi,LIU Qiang,XING Ting-wen,YAO Han-min. Three-dimension photonic crystals fabrication using SU-8 photoresist[J]. Opto-Electronic Engineering, 2007, 34(8): 28-31 |
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| Authors: | ZHANG Xiao-yu GAO Hong-tao ZHOU Chong-xi LIU Qiang XING Ting-wen YAO Han-min |
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| Affiliation: | State Key Laboratory of Optical Technologies for Microfabrication, the Institute of Optics and Electronics, the Chinese Academy of Sciences, Chengdu 610209, China |
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| Abstract: | In order to study SU-8 photoresist application to three-dimension photonic crystals fabrication,the separation of epon SU-8 was proposed and realized using column chromatography and size exclusion chromatography. The results indicate that the molecular weight distribution of epon SU-8 is from about 100 to 100000,and includes SU-1,SU-2,SU-4,SU-6,and SU-8 different component,and their mixture. According to the separation results,the optimal SU-8 photoresist was compounded using SU-6 and SU-8 pure component and the optimal lithography process was gotten. The three-dimension face-centered-cubic photonic crystals with crystal lattice constant 922nm were fabricated using interference lithography. |
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| Keywords: | SU-8 photoresist 3-D photonic crystals column chromatography size exclusion chromatography |
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