| PREPARATION OF B-N FILMS BY ION BEAM ASSISTED DEPOSITION |
| |
| 引用本文： | JIANG Hai TAO Kun LI Hengde Tsinghua University,Beijing,China lecturer,Department of Materials Science and Engineering,Tsinghua University,Beijing 100084,China. PREPARATION OF B-N FILMS BY ION BEAM ASSISTED DEPOSITION[J]. 金属学报(英文版), 1993, 6(11): 379-382 |
| |
| 作者姓名： | JIANG Hai TAO Kun LI Hengde Tsinghua University Beijing China lecturer Department of Materials Science and Engineering Tsinghua University Beijing 100084 China |
| |
| 作者单位： | JIANG Hai TAO Kun LI Hengde Tsinghua University，Beijing，China lecturer，Department of Materials Science and Engineering，Tsinghua University，Beijing 100084，China |
| |
| 摘 要： | BN films,synthesized by ion beam assisted deposition,were analysed by RBS,AES,IR spectra and TEM.Formatiom of c-BN phase was shown not only by IR spectra atabsorption peak of 1100 cm~(-1),but also by electron diffraction pattern.The results ofAES demonstrate an effect of N~+ implantation near the film surface.The deposited filmsconsist of three layers,i.e.,ion implantation layer,film layer and mixed intermediatelayer,according to the difference of concentration.The micro-Knoop hardness of the film is25—35 GPa.
|
| 收稿时间： | 1993-11-11 |
| 修稿时间： | 1993-11-11 |
PREPARATION OF B-N FILMS BY ION BEAM ASSISTED DEPOSITION |
| |
| JIANG Hai TAO Kun LI Hengde Tsinghua University,Beijing,China lecturer. PREPARATION OF B-N FILMS BY ION BEAM ASSISTED DEPOSITION[J]. Acta Metallurgica Sinica(English Letters), 1993, 6(11): 379-382 |
| |
| Authors: | JIANG Hai TAO Kun LI Hengde Tsinghua University Beijing China lecturer |
| |
| Affiliation: | JIANG Hai TAO Kun LI Hengde Tsinghua University,Beijing,China lecturer,Department of Materials Science and Engineering,Tsinghua University,Beijing,China |
| |
| Abstract: | BN films,synthesized by ion beam assisted deposition,were analysed by RBS,AES, IR spectra and TEM.Formatiom of c-BN phase was shown not only by IR spectra at absorption peak of 1100 cm~(-1),but also by electron diffraction pattern.The results of AES demonstrate an effect of N~+ implantation near the film surface.The deposited films consist of three layers,i.e.,ion implantation layer,film layer and mixed intermediatelayer, according to the difference of concentration.The micro-Knoop hardness of the film is 25—35 GPa. |
| |
| Keywords: | ion beam assisted deposition BN film |
| 本文献已被 CNKI 等数据库收录！ |
| 点击此处可从《金属学报(英文版)》浏览原始摘要信息 |
|
点击此处可从《金属学报(英文版)》下载全文 |
|
