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静压法合成含硼金刚石结构及电阻特性研究
引用本文:宫建红,林淑霞,高军. 静压法合成含硼金刚石结构及电阻特性研究[J]. 功能材料, 2012, 43(4): 430-432
作者姓名:宫建红  林淑霞  高军
作者单位:山东大学威海分校机电与信息工程学院,山东威海,264209
基金项目:国家自然科学基金资助项目
摘    要:采用在铁基触媒中加入硼铁粉的方法制成Fe-Ni-C-B系触媒,用静压法合成含硼金刚石。研究了含硼金刚石的形貌、晶体结构和电阻-温度曲线。实验结果表明,在不同温度区间内,金刚石具有不同的电离能,分析了其原因。同时测得此含硼金刚石的最高工作温度为773K左右。为高温半导体金刚石的研究提供了实验基础。

关 键 词:金刚石    结构  电阻  性能

Study on the crystal structure and resistance properties of the boron-doped diamonds synthesized from Fe-Ni-C-B system
GONG Jian-hong,LIN Shu-xia,GAO Jun. Study on the crystal structure and resistance properties of the boron-doped diamonds synthesized from Fe-Ni-C-B system[J]. Journal of Functional Materials, 2012, 43(4): 430-432
Authors:GONG Jian-hong  LIN Shu-xia  GAO Jun
Affiliation:(School of Mechanical & Electrical Engineering,Shandong University at Weihai,Weihai 264209,China)
Abstract:In present paper,boron-doped diamond was synthesized by static pressure method using Fe-Ni-C-B system catalyst.The morphology,crystal structure,resistance-temperature characteristic curve were studied.Experiments proved that the boron-doped diamond has different ionization energy at different temperature range and the reason is analyzed.The maximum operating temperature is about 773K for such boron-doped diamond.This study provides an experimental basis for high-temperature semiconductor diamond.
Keywords:diamond  boron  crystal structure  resistance  properties
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