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Tuning exchange bias in epitaxial Ni/MgO/TiN heterostructures integrated on Si(1 0 0)
Affiliation:1. Department of Materials Science & Engineering, North Carolina State University, Raleigh, NC 27695, USA;2. Materials Science Division, Army Research Office, Research Triangle Park, NC 27709, USA;1. School of Materials, Sun Yat-sen University, Guangzhou, Guangdong 510275, China;2. School of Materials Engineering, Purdue University, West Lafayette, IN 47907, USA;3. School of Electrical and Computer Engineering, Purdue University, West Lafayette, IN 47907, USA;1. Aix Marseille Univ, IM2NP, Fac Sci St Jérôme, F-13397 Marseille, France;2. CNRS LAAS, 7 avenue du Colonel Roche, F-31400 Toulouse, France;3. Univ de Toulouse, LAAS, F-31400 Toulouse, France;1. University Grenoble Alpes, SPINTEC, F-38000 Grenoble, France;2. CNRS, SPINTEC, F-38000 Grenoble, France;3. CEA, INAC-SPINTEC, F-38000 Grenoble, France;4. CROCUS Technology, F-38000 Grenoble, France
Abstract:Epitaxial Ni thin films are integrated with tunneling barrier MgO on Si(1 0 0) substrate. During pulsed laser deposition, early island-like structure transformed into uniform thin film with increasing number of laser pulses. This led to transitions in exchange bias from positive to negative and back to positive, which is ascribed to morphology associated residual strain. The Ni island structure has a coercive field as high as 3 times of that of the continuous film. The current work holds a tremendous promise in the realization of magnetic devices integrated with the Si-platform.
Keywords:Epitaxial Ni thin films  Exchange bias  Pulsed laser deposition  Domain matching epitaxy
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