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Effects of Al2O3 on Thermal Stability and Electrical Reliability of HfO2 Film on Strained SiGe
Authors:Xu Dapeng  Wan Li  Cheng Xinhong  He Dawei  Song Zhaorui  Yu Yuehui  Shen Dashen
Affiliation:Wenzhou University, Wenzhou 325027, China;Wenzhou University, Wenzhou 325027, China;State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem & Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem & Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem & Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem & Information Technology, Chinese Academy of Sciences, Shanghai 200050, China;University of Alabama in Huntsville, Huntsville, Alabama 35899, USA
Abstract:
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