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Cat-CVD SiN passivation films for OLEDs and packaging |
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| Authors: | Akira Heya Toshiharu Minamikawa Shigehira Minami Hironobu Umemoto Naoto Matsuo |
| Affiliation: | a University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2280, Japan b Industrial Research Institute of Ishikawa, 2-1 Kuratsuki, Kanazawa, Ishikawa 920-8203, Japan c Ishikawa Seisakusho, Ltd., 200 Fukudome, Hakusan, Ishikawa 924-0051, Japan d Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan |
| Abstract: | A Roll-to-roll type catalytic chemical vapor deposition (Cat-CVD) apparatus was developed for the application to flexible organic light-emitting diode (OLED) displays and packaging. Silicon nitride (SiNx) films were prepared by this roll-to-roll type apparatus at temperatures below 60 °C. It was found that these SiNx films are highly moisture resistant, and the water vapor transmission rate (WVTR) on plastic substrates could be lowered to 0.01 g/m2 day. Roll-to-roll type Cat-CVD is one of the most promising methods for the preparation of barrier films for OLED displays and packaging. |
| Keywords: | Cat-CVD Passivation Barrier film Roll to roll Silicon nitride Organic light-emitting diode Water vapor transmission rate Ca corrosion test |
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