Desorption process of copper chlorides from copper surface

Gaseous copper chlorides can be employed as precursors in a newly developed Cu-CVD method called metal chloride reduction-chemical vapor deposition (MCR-CVD). More than one species exists in the gas phase of copper chloride. We studied the gas phase composition of copper chlorides generated by etching of copper surface by electron impact-mass spectrometry. The composition of gaseous species can change because of gas phase reactions. After desorbing from the copper surface, copper chloride reached equilibrium composition immediately.