Fabrication of diffraction grating for X-ray Talbot interferometer |
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| Authors: | Masatake Matsumoto Kinji Takiguchi Makoto Tanaka Yoichi Hunabiki Hiroaki Takeda Atsushi Momose Yuichi Utsumi Tadashi Hattori |
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| Affiliation: | (1) Nagase Chemtex Co. Ltd, 236 Tatsunocho-nakai, Tatsuno, Hyogo 679-4124, Japan;(2) Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology, Himeji, Japan;(3) Nano Create Co. Ltd, Hyogo, Japan;(4) IKEX Industry Co. Ltd, Aichi, Japan;(5) The University of Tokyo, Tokyo, Japan;(6) University of Hyogo, Hyogo, Japan |
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| Abstract: | Imaging technology using the phase data attracts attention from many researchers as the observation technique of a biomechanical material. We produced a diffraction grating for obtaining high-resolution phase data. We designed the new process flow and developed the fabrication technique composed of MEMS technology, X-ray lithography, and micro electroplating. The X-ray lithography process was performed using the NewSUBARU synchrotron radiation facility. The line and the aspect ratio of this grating were 4 μm and above 5 μm, respectively. We evaluated the diffraction grating in SPring-8. |
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