| 超大规模集成电路制造工厂照明设计 |
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| 引用本文： | 高小平,顾金卫.超大规模集成电路制造工厂照明设计[J].低压电器,2003(5):27-28,35. |
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| 作者姓名： | 高小平 顾金卫 |
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| 作者单位： | 中国船舶工业第九设计研究院,200063 |
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| 摘 要： | 结合《洁净厂房设计规范》与超大规模集成电路制造工厂的特点，阐述了照明电源、照度标准、备用照明、照明灯具的选择及安装等，介绍了超大规模集成电路制造工厂照明设计的要求及设计要点。
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| 关 键 词： | 照明设计 《洁净厂房设计规范》 建筑物 超大规模集成电路制造工厂 |
Lighting Design for VLSI Factory |
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| GAO Xiaoping,GU Jinwei,No. Design & Research Institute of Ship Industry of China.Lighting Design for VLSI Factory[J].Low Voltage Apparatus,2003(5):27-28,35. |
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| Authors: | GAO Xiaoping GU Jinwei No Design & Research Institute of Ship Industry of China |
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| Abstract: | Based on the features of design specifications for clean workshop and VLSI factory, the lighting power supply, illumination standard, back up lighting, the selection and installation of lighting lamps and lanterns etc. were expounded, and the design requirements and design key points of lighting design of for VLSI factory were introduced. |
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| Keywords: | clean workshop voltage drop illumination electrostatic dissipation harmonic |
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