Electron field emission from filtered arc deposited diamond-like carbon films using Au and Ti layers |
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| Affiliation: | 1. Faculty of Technology and Education, Koszalin University of Technology, ul. Sniadeckich 2, 75-453 Koszalin, Poland;2. A. V. Luikov Heat and Mass Transfer Institute National Academy of Sciences of Belarus, 15 P. Brovki str., 220072 Minsk, Belarus |
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| Abstract: | In this work, tetrahedral diamond-like carbon (DLC) films are deposited on Si, Ti/Si and Au/Si substrates by a new plasma deposition technique — filtered arc deposition (FAD). Their electron field emission characteristics and fluorescent displays of the films are tested using a diode structure. It is shown that the substrate can markedly influence the emission behavior of DLC films. An emission current of 0.1 μA is detected at electric field EDLC/Si=5.6 V/μm, EDLC/Au/Si=14.3 V/μm, and EDLC/Ti/Si=5.2 V/μm, respectively. At 14.3 V/μm, an emission current density JDLC/Si=15.2 μA/cm2, JDLC/Au/Si=0.4 μA/cm2, and JDLC/Ti/Si=175 μA/cm2 is achieved, respectively. It is believed that a thin TiC transition layer exists in the interface between the DLC film and Ti/Si substrate. |
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