Multiple twinning and nitrogen defect center in chemical vapor deposited homoepitaxial diamond

Homoepitaxial diamond films were grown on polished {100} faces of single crystal type IIa diamond substrates using microwave plasma assisted chemical vapor deposition system. 14 homoepitaxial diamond films were grown under a variety of substrate temperatures (1000–2000°C), methane concentration (1–6% in hydrogen gas) and processing pressure (60–200 Torr). Electron paramagnetic resonance (EPR) studies demonstrate that nitrogen is incorporated as a singly substitutional impurity (P1-defect center) and the nitrogen concentration is in the range 10–100 parts per million (ppm). The substitutional nitrogen concentration in homoepitaxial diamond was observed to decrease with increasing substrate temperature. Multitwin percentages of all grown diamonds derived from EPR spectra are correlated with the growth parameter α, which is simply the growth velocity along the 〈100〉 direction divided by the growth velocity along the 〈111〉 direction. With the aid of multitwin morphology and multitwin percentages derived from EPR, we describe conditions under which a twin-free and low defect single crystal diamond can be grown from the vapor phase on the {100} oriented substrates.