| Improved Non-uniformity Correction Method for Uncooled Microbolometer |
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| 引用本文： | MENG Li-ya YUAN Xiang-hui LU Guo-lin HUANG You-shu. Improved Non-uniformity Correction Method for Uncooled Microbolometer[J]. 半导体光子学与技术, 2005, 11(4): 266-269,286 |
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| 作者姓名： | MENG Li-ya YUAN Xiang-hui LU Guo-lin HUANG You-shu |
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| 作者单位： | Key Lab. of Optoelectron. Technol. and Syst. for the Education Ministry of China, Chongqing University, Chongqing 400044, CHN |
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| 摘 要： | The uncooled microbolometer has a severe temperature requirement for non-uniformity correction. An improved two-point non-uniformity correction method is proposed, which can operate in wider uniform substrate temperatures. This method can control the bias voltage of MOS transistors by memory and DAC to meet two restrictions about responsivity and offset before traditional two-point calibration is implemented. The simulation results seem that this non-uniformity correction can work at uniform substrate temperature with fluctuant range of 4K.
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| 关 键 词： | 微观测辐射热仪 感光温度 金属氧化物半导体 场效应管 |
| 文章编号： | 1007-0206（2005）04-0266-04 |
| 收稿时间： | 2005-04-19 |
| 修稿时间： | 2005-05-10 |
Improved Non-uniformity Correction Method for Uncooled Microbolometer |
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| MENG Li-ya,YUAN Xiang-hui,L Guo-lin,HUANG You-shu. Improved Non-uniformity Correction Method for Uncooled Microbolometer[J]. Semiconductor Photonics and Technology, 2005, 11(4): 266-269,286 |
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| Authors: | MENG Li-ya YUAN Xiang-hui L Guo-lin HUANG You-shu |
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| Affiliation: | MENG Li-ya,YUAN Xiang-hui,L(U) Guo-lin,HUANG You-shu |
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| Abstract: | The uncooled microbolometer has a severe temperature requirement for non-uniformity correction. An improved two-point non-uniformity correction method is proposed, which can operate in wider uniform substrate temperatures. This method can control the bias voltage of MOS transistors by memory and DAC to meet two restrictions about responsivity and offset before traditional two-point calibration is implemented. The simulation results seem that this non-uniformity correction can work at uniform substrate temperature with fluctuant range of 4 K. |
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| Keywords: | Microbolometer Non-uniformity correction Substrate temperature |
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