Field emission studies of CVD diamond thin films: effect of acid treatment |
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Authors: | PM KoinkarPP Patil MA More VN TondareDS Joag |
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Affiliation: | a Department of Physics, School of Physical Sciences, North Maharashtra University, Jalgaon 425 001, Indiab Department of Physics, Center for Advanced Studies in Materials Science and Solid State Physics, University of Pune, Pune 411 007, India |
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Abstract: | Field emission from CVD diamond thin films deposited on silicon substrate has been studied. The diamond films were synthesized using hot filament chemical vapor deposition technique. Field emission studies of as-deposited and acid-treated films were carried out using ‘diode’ configuration in an all metal UHV chamber. Upon acid treatment, the field emission current is found to decrease by two orders of magnitude with increase in the turn-on voltage by 30%. This has been attributed to the removal of sp2 content present in the film due to acid etching. Raman spectra of both the as-deposited and acid-treated films exhibit identical spectral features, a well-defined peak at 1333 cm−1 and a broad hump around 1550 cm−1, signatures of diamond (sp3 phase) and graphite (sp2 phase), respectively. However upon acid treatment, the ratio (Id/Ig) is observed to decrease which supports the speculation of removal of sp2 content from the film. The surface roughness was studied using atomic force microscopy (AFM). The AFM images indicate increase in the number of protrusions with slight enhancement in overall surface roughness after acid etching. The degradation of field emission current despite an increase in film surface roughness upon acid treatment implies that the sp2 content plays significant role in field emission characteristics of CVD diamond films. |
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Keywords: | CVD diamond Field emission Field emission display Atomic force microscopy Raman spectroscopy |
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