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Photoinduced hydroxylation at ZnO surface |
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| Authors: | N AsakumaT Fukui M TokiK Awazu H Imai |
| Affiliation: | a Department of Applied Chemistry, Faculty of Science and Technology, Keio University, Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan b Kansai Research Institute, 17 Chudojiminami-machi, Shimogyo-ku, Kyoto 600-8813, Japan c National Institute of Advanced Industrial Science and Technology, 1-1-4 Umezono, Tsukuba, Ibaraki 305-8565, Japan |
| Abstract: | We observed UV-stimulated hydroxylation at the surface of ZnO crystals. Reactive defective sites were initially formed in the surface layer via photoreduction induced with energetic photons above the band gap of ZnO. Hydroxyl groups were produced by a chemical reaction of the photoinduced defective sites with water molecules in the atmosphere. Two types of hydroxyl groups were found at the irradiated surface because two kinds of defective sites were induced with the UV illumination. |
| Keywords: | ZnO Hydroxylation Ultraviolet Photoreduction Surface |
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