Photocatalytic activity studies of TiO2 thin films prepared by r.f. magnetron reactive sputtering |
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| Authors: | SK ZhengG Xiang TM Wang F PanC Wang WC Hao |
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| Affiliation: | a Center of Material Physics and Chemistry, School of Science, Beijing University of Astronautics and Aeronautics, Beijing, 100083, People's Republic of Chinab Physics Department of Pennsylvania State University, University Park, PA 16802, USA |
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| Abstract: | A series of transparent titanium dioxide thin films have been obtained on microscope glass slides by means of r.f. magnetron reactive sputtering using Ar and O2 mixed gases. The photocatalytic activity of the TiO2 thin films was evaluated by the degradation of rhodamine B dye wastewater. The influences of substrate temperatures and total sputtering pressures on the photocatalytic activity of the TiO2 films were investigated. It was observed that substrate temperature had little influences on the photocatalytic activity, but the photocatalytic activity of the TiO2 thin films was improved by decreasing the total sputtering pressure. |
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| Keywords: | Titanium dioxide Photocatalytic activity r f magnetron sputtering |
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