电弧源自身大颗粒抑制技术研究进展

电弧离子镀技术已经成为镀膜技术中不可或缺的技术之一，并在金属、装饰、硬质耐磨等领域被广泛研究和应用。膜层技术的研究应用促使对电弧源技术的研究主要集中在长寿命、高可靠性和大颗粒抑制这几方面，且后者的开展必须建立在前者的基础上。大颗粒抑制的关键在于减少弧斑在靶面的驻留时间，可通过巧妙的永磁或电磁设计来实现具有较强横向磁场分量的靶面，但当磁场强度增大时，必须综合考虑纵向磁场和横向磁场的比例关系，考虑靶材本身的特点。另一种抑制大颗粒的方法是脉冲电弧技术，脉冲电弧源引弧频繁，在结构设计上和恒流电弧源有很大的区别，瞬时电流能达到数千、甚至一万安培以上，能够获得很高的沉积速率，同时阳极的设计使等离子体形成定向喷射，过滤掉大部分大颗粒。

Review of Macroparticle Suppression Methods in Arc Source

Vacuum arc deposition has become one of the indispensable techniques in the coating field, and it is widely studied and applied in the metal, decoration, hard wear resistance, and other fields. The application research of coating techniques promotes the investigation on arc source technique, which mainly focuses on the fields of long life, high reliability, and macroparticle suppression. The realization of macroparticle suppression is based on the satisfaction of long life and high reliability. With reducing the residence time of arc spots on the target surface, the macroparticle suppression can be obtained. This result can be achieved by ingenious design of permanent magnet or electromagnetism, thereby obtaining a target surface with strong transverse magnetic component. However, when the magnetic field intensity increases, the internal characteristics of target and the proportional relationship between the longitudinal magnetic field and the transverse magnetic field should be comprehensively considered. Another macroparticle suppression method is the pulsed arc technique. The pulsed arc source frequently strikes the arc, which is very different from the direct current arc source in structure design. The instantaneous current can reach thousands, even more than ten thousands amperes, therefore obtaining a high deposition rate. At the same time, the anode design leads to the directional jet of plasma, which can filter out most large particles.