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Precise Control of Temperature Rising Speed of Wafer during Rapid Thermal Processing
Authors:Shigeki Hirasawa Tsuyoshi Kawanami Katsuaki Shirai Tetsuya Urimoto Naoki Morimoto Atsushi Fujiwara Sadanori Toda
Affiliation:Department of Mechanical Engineering, Kobe University, Kobe 657-8501, Japan
Abstract:Electronic equipment manufacturing, rapid heating, heat treatment, temperature control, PID control.
Keywords:Electronic equipment manufacturing   rapid heating   heat treatment   temperature control   PID control.
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