| PLZT陶瓷靶材及溅射薄膜的微观结构研究 |
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| 引用本文： | 卢德新,黄龙波.PLZT陶瓷靶材及溅射薄膜的微观结构研究[J].无机材料学报,1994,9(2):179-183. |
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| 作者姓名： | 卢德新 黄龙波 |
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| 作者单位： | 武汉华中理工大学固体电子学系 |
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| 摘 要： | 研究了铁电ＰＬＺＴ（７．５／６５／３５）陶瓷靶材及用射频磁控溅射法制备的相同组分陶瓷薄膜的矿物结构及显微结构。实验结果表明，与陶瓷靶材相比，陶瓷薄膜的结晶取向发生了较大的变化，晶粒度减小，致密度提高，但晶粒无完整的晶形。随退火温度的提高，薄膜的缺陷明显增加。
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| 关 键 词： | 陶瓷 薄膜 铁电陶瓷 靶材 |
Study on the Microstructure of PLZT Ceramic Target and Thin Films |
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| Lu Dexin,HuangLongbo, Liu Xingjie,Lin Gengqi, Hu Yongshi, Li Zuoyi.Study on the Microstructure of PLZT Ceramic Target and Thin Films[J].Journal of Inorganic Materials,1994,9(2):179-183. |
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| Authors: | Lu Dexin HuangLongbo Liu Xingjie Lin Gengqi Hu Yongshi Li Zuoyi |
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| Abstract: | The paper studied the mineral-structure and micro -structure of the ferroelectric PLZT(7.5/65/35)Ceramic target and the same composition thin films using R. F. magnetron sputtering technique. Theresults show that the orientation of the ceramic thin films has changed greatly3 the grain-size has decreased, and the density has improved as compared with the ceramic target. But the grains haven'tdefined grain-boundary and shape. As the annealing temperature increasing, the defects of the thin filmsincrease manifestly. |
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| Keywords: | PLZT ceramic target and thin films microstructure |
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