基于计算全息的斜面和曲面光刻

斜面和曲面微结构元件在微电子学、微光学、微流体学等领域有着重要的应用，为了实现快速、低成本的斜面和曲面光刻，提出了利用基于液晶空间光调制器的纯相位计算全息技术投影目标图案到斜面和曲面进行曝光的方法。生成了斜面和球面全息光场，对光场进行消散斑和杂散光去除的处理，完成了斜面和球面光刻实验验证。实验结果表明:该方法加工效率高、设计灵活多变，不受单一结构限制，是一种极具潜力的三维微纳加工方法。

Optical lithography on tilted and curved surfaces based on computer generated holography

Micro-structural elements on tilted and curved surfaces has important applications in microelectronics, micro-optics, micro-fluidics and other fields. In order to achieve rapid and low-cost lithography of tilted and curved surfaces, the method is proposed, in which pure phase computer generated holography technology based on liquid crystal spatial light modulator is used to project target pattern to the tilted and curved surfaces completing exposure. The tilted and curved surfaces pure phase computer generated holographic light fields are generated, and the speckle elimination and stray light removal of the optical field are processed. The experimental verification of tilted and curved surfaces lithography is completed. The experimental results show that the method has high machining efficiency, flexible design and is not limited by a single structure. It is a potential 3D micro-nano machining method.