红外光场成像中的辐射定标与校正

为了实现在长波红外波段应用光场成像技术，对红外光场成像中的辐射定标与非均匀性进行了研究。首先，根据光场成像和非均匀性校正的原理，提出了红外光场成像辐射定标模型，分析了响应漂移与非均匀性的关系。接着，设计标准黑体实验，记录两点校正法定标后30 h内的图像数据，对比了相同条件下光场数据和光场成像的非均匀性变化情况。实验结果表明:在10 min~30 h内，光场数据的非均匀性由0.062%增大到0.62%，光场成像的非均匀性由0.024%增大到0.27%。响应漂移对红外光场成像非均匀性的影响受到微透镜阵列渐晕和重聚焦计算的共同作用。重聚焦计算可有效抑制由响应漂移引起的非均匀性增长。

Radiation calibration and correction in infrared light field imaging

To realize the application of light field imaging technology in the longwave infrared band, the radiation calibration and nonuniformity in infrared light field imaging were investigated. First, according to the principle of light field imaging and nonuniformity correction, a radiation calibration model for infrared light field imaging was proposed, and the relationship between response drift and nonuniformity was analysed. Next, a standard blackbody experiment was designed to record the image data within 30 hours after the two-point calibration, and the nonuniformity changes of light field data and light field imaging under the same conditions were compared. The experimental results show that within 10 minutes to 30 hours, the nonuniformity of light field data increases from 0.062% to 0.62%, while the nonuniformity of light field imaging increases from 0.024% to 0.27%. Therefore, the effect of response drift on the nonuniformity of infrared light field imaging is affected by the calculation of vignetting and refocusing of the microlens array. Refocusing can effectively suppress the increase in nonuniformity due to response drift.